Atomflo™ plasma systems are an effective, low-cost solution for R&D and process development on semiconductors, solar cells, batteries and sensors:

  • Surface activation for direct wafer bonding and thin film adhesion
  • Enhanced wettability for improving liquid flow over wafer surfaces
  • Metal oxide removal for metal-metal bonding
  • Wafer cleaning and organic contamination removal
  • Photoresist etching

Atomflo™ plasma systems provide highly repeatable, single part processing with excellent treatment uniformity.

Please contact us for further information.