9月 04 2012

Surfx Unveils New Atmospheric Plasma Products


Surfx Atomflo 500

Today at SEMICON Taiwan, Surfx Technologies just released a new range of atmospheric plasma products with increased performance and additional features. Customers now have even more choices in high-speed plasma systems that can also be easily integrated into existing production environments.

Our patented downstream plasma will not expose sensitive electronics or circuits to potentially damaging electric fields. We also offer high speed LED encapsulation processes as well as solar thin film and silicon cell process solutions. Customers will gain better performance, single part traceability and increase package yield.”

The Atomflo™ 500 atmospheric plasma controller, which offers real time process feedback, argon or helium primary gas, multiple secondary gas handling and integrated machine I/O is now available from Surfx Technologies. The Atomflo 500 is an excellent fit for demanding high-throughput production applications that require direct real-time process monitoring feedback. This completely new controller design includes a touch-screen user interface, increased RF power and high-speed RF tuning, and an increased accuracy of the matching network.

surfx-spmSurfx Technologies also released the Standalone Plasma Machine (SPM) to provide customers with a turnkey system that integrates the Atomflo 500 solution into an automated, compact, multi-axis application system. The SPM includes advanced graphical motion management software (generating NC code for the motion engine), 4-axis motion with 400 x 400 x 300 mm plasma treatment volume and modular control system architecture, capable of interfacing to other systems via network communication and/or SMEMA interface.

We also launched the new Atomflo 400S, an upgrade of its popular A400 model, which can be used as a standalone R&D tool or integrated with any motion system to automate customer’s process needs. Additional process parameters and an increased controller memory for additional stored process recipes and simplified recipe management, will result in faster tuning performance for customers.

Atmospheric pressure plasmas eliminate the need for harsh chemicals or inefficient vacuum chambers that are limited to batch processes. The Atomflo atmospheric pressure plasma generates a stream of reactive gas at low temperatures so many materials can be treated, including polymers, epoxies, metals, ceramics and glass.


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