Atomflo™ plasma systems are an effective, low-cost solution for R&D and process development on semiconductors, solar cells, batteries and sensors:
- Surface activation for direct wafer bonding and thin film adhesion
- Enhanced wettability for improving liquid flow over wafer surfaces
- Metal oxide removal for metal-metal bonding
- Wafer cleaning and organic contamination removal
- Photoresist etching
Atomflo™ plasma systems provide highly repeatable, single part processing with excellent treatment uniformity.
Please contact us for further information.